China’s EUV Breakthrough: A Semiconductor Milestone and Western Concerns
China’s semiconductor industry may have achieved a significant advancement by reportedly building a fully functional EUV lithography prototype. The prototype utilizes older ASML machine parts, but its development marks a considerable step forward, potentially accelerating China’s path to semiconductor independence. Although the machine hasn’t produced any chips yet, sources suggest a mainstream rollout could occur by 2030, a timeline sooner than previously predicted, driven by the growing demand for self-built semiconductors. This progress comes as companies like Huawei seek greater chip capacity and as China continues to navigate technological limitations in its pursuit of advanced chipmaking capabilities.